Electroless Cu deposition

英 美
  • 化学镀铜
  • CU abbr.闭合(=Close-Up)abbr.控制单元(=ControlUnit)
  • deposition n.沉积;免职;[律]宣誓作证;证言
  • electroless adj.无电的
    1. The microstructure of electroless copper deposit is greatly effected by the substrate upon which deposition occurs.
      化学镀铜层的显微结构受基体的显著影响。
    2. Electroless copper plating on PET fabrics using hypophosphite as reducing agent was investigated.
      研究了采用次磷酸钠作还原剂在涤纶织物上化学镀铜。